3 157

Cited 0 times in

Iridium Oxide as a Stimulating Neural Electrode Formed by Reactive Magnetron Sputtering

Authors
 In Seop Lee  ;  J.M. Park  ;  Fu Zhai Cui  ;  Y.H. Lee  ;  Geun Hee Lee  ;  Jong Chul Park  ;  Hyun Joo Son 
Citation
 Key Engineering Materials, Vol.288~289 : 307-310, 2005 
Journal Title
 Key Engineering Materials 
ISSN
 1013-9826 
Issue Date
2005
MeSH
Charge Injection ; Iridium Oxide ; Neural Electrode ; Reactive Sputtering ; Stimulation
Keywords
Charge Injection ; Iridium Oxide ; Neural Electrode ; Reactive Sputtering ; Stimulation
Abstract
Implantable neural prostheses form hybrid interfaces with biological constructs, and the application of electrical fields can restore functions of patients with neurological damages. The various stoichiometric compositions of iridium oxide were synthesized using reactive magnetron sputtering. The charge injection behavior of iridium oxide deposited with an O2/Ar ratio of 0.5 was similar to pure Ir. The charge density of iridium oxide increased with increasing O2/Ar ratio, and increasing thickness of iridium oxide.
Full Text
http://www.scientific.net/KEM.288-289.307
DOI
10.4028/www.scientific.net/KEM.288-289.307
Appears in Collections:
1. College of Medicine (의과대학) > Dept. of Medical Engineering (의학공학교실) > 1. Journal Papers
Yonsei Authors
Park, Jong Chul(박종철) ORCID logo https://orcid.org/0000-0003-0083-5991
Son, Hyun Joo(손현주)
URI
https://ir.ymlib.yonsei.ac.kr/handle/22282913/114841
사서에게 알리기
  feedback

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Browse