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Iridium Oxide as a Stimulating Neural Electrode Formed by Reactive Magnetron Sputtering
DC Field | Value | Language |
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dc.contributor.author | 박종철 | - |
dc.date.accessioned | 2015-08-26T16:38:40Z | - |
dc.date.available | 2015-08-26T16:38:40Z | - |
dc.date.issued | 2005 | - |
dc.identifier.issn | 1013-9826 | - |
dc.identifier.uri | https://ir.ymlib.yonsei.ac.kr/handle/22282913/114841 | - |
dc.description.abstract | Implantable neural prostheses form hybrid interfaces with biological constructs, and the application of electrical fields can restore functions of patients with neurological damages. The various stoichiometric compositions of iridium oxide were synthesized using reactive magnetron sputtering. The charge injection behavior of iridium oxide deposited with an O2/Ar ratio of 0.5 was similar to pure Ir. The charge density of iridium oxide increased with increasing O2/Ar ratio, and increasing thickness of iridium oxide. | - |
dc.description.statementOfResponsibility | open | - |
dc.relation.isPartOf | Key Engineering Materials | - |
dc.rights | CC BY-NC-ND 2.0 KR | - |
dc.rights.uri | https://creativecommons.org/licenses/by-nc-nd/2.0/kr/ | - |
dc.subject.MESH | Charge Injection | - |
dc.subject.MESH | Iridium Oxide | - |
dc.subject.MESH | Neural Electrode | - |
dc.subject.MESH | Reactive Sputtering | - |
dc.subject.MESH | Stimulation | - |
dc.title | Iridium Oxide as a Stimulating Neural Electrode Formed by Reactive Magnetron Sputtering | - |
dc.type | Article | - |
dc.contributor.college | College of Medicine (의과대학) | - |
dc.contributor.department | Dept. of Medical Engineering (의학공학) | - |
dc.contributor.googleauthor | In Seop Lee | - |
dc.contributor.googleauthor | J.M. Park | - |
dc.contributor.googleauthor | Fu Zhai Cui | - |
dc.contributor.googleauthor | Y.H. Lee | - |
dc.contributor.googleauthor | Geun Hee Lee | - |
dc.contributor.googleauthor | Jong Chul Park | - |
dc.contributor.googleauthor | Hyun Joo Son | - |
dc.identifier.doi | 10.4028/www.scientific.net/KEM.288-289.307 | - |
dc.admin.author | false | - |
dc.admin.mapping | false | - |
dc.contributor.localId | A01662 | - |
dc.contributor.localId | A02001 | - |
dc.relation.journalcode | J01939 | - |
dc.identifier.pmid | 10.4028/www.scientific.net/KEM.288-289.307 | - |
dc.identifier.url | http://www.scientific.net/KEM.288-289.307 | - |
dc.subject.keyword | Charge Injection | - |
dc.subject.keyword | Iridium Oxide | - |
dc.subject.keyword | Neural Electrode | - |
dc.subject.keyword | Reactive Sputtering | - |
dc.subject.keyword | Stimulation | - |
dc.contributor.alternativeName | Park, Jong Chul | - |
dc.contributor.affiliatedAuthor | Park, Jong Chul | - |
dc.rights.accessRights | not free | - |
dc.citation.volume | 288~289 | - |
dc.citation.startPage | 307 | - |
dc.citation.endPage | 310 | - |
dc.identifier.bibliographicCitation | Key Engineering Materials, Vol.288~289 : 307-310, 2005 | - |
dc.identifier.rimsid | 38510 | - |
dc.type.rims | ART | - |
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