The characteristics of ZnO films are reported depending on different deposition conditions for film bulk acoustic resonators (FBARs). The ZnO films have been deposited on Al films evaporated on p-type (100) silicon substrate by a pulsed laser deposition (PLD) technique using a Nd:YAG laser. We have investigated the c-axis orientation and the electrical resistivity of the ZnO films. These results show the possibility of FBAR devices using PLD.