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Skin irritation in children undergoing orthodontic facemask therapy

Authors
 Harim Kim  ;  Jung Suk Kim  ;  Cheol Soon Kim  ;  Su Youn Becker-Weimann  ;  Jung-Yul Cha  ;  Sung-Hwan Choi 
Citation
 SCIENTIFIC REPORTS, Vol.13(1) : 2200, 2023-02 
Journal Title
SCIENTIFIC REPORTS
Issue Date
2023-02
MeSH
Cephalometry / methods ; Child ; Extraoral Traction Appliances ; Female ; Humans ; Malocclusion, Angle Class III* ; Mandible ; Masks* ; Maxilla ; Retrospective Studies
Abstract
Orthodontic facemasks are extraoral orthodontic appliances that influence maxillary and mandibular development in children with skeletal Class III malocclusion. While a facemask is most effective in patients before the growth spurt, skin irritation is common during the treatment. Therefore, this retrospective study aimed to investigate the prevalence and pattern of such skin changes and identify their possible associated risk factors. We included 177 patients with skeletal Class III malocclusion who underwent facemask therapy. Patient age and sex, orthodontic parameters expressing the severity of malocclusion, the presence of complaints in the temporomandibular joint (TMJ) areas, and the level of patient cooperation were evaluated. Additionally, the severity and onset time of skin reactions were further analyzed. The results indicated that 43.5% of patients developed skin changes typical of irritant contact dermatitis. Skin irritation was significantly associated with the presence of TMJ complaints and female sex. Furthermore, skin irritation was more common in younger patients. Clinicians should pay special attention to the skin areas that come into contact with the appliance during each follow-up visit to detect potential problems. Moreover, patients and their parents should be given adequate information about the possibility, prevention, and management of skin problems during facemask therapy.
Files in This Item:
T202301049.pdf Download
DOI
10.1038/s41598-023-29253-0
Appears in Collections:
2. College of Dentistry (치과대학) > Dept. of Orthodontics (교정과학교실) > 1. Journal Papers
Yonsei Authors
Kim, Harim(김하림) ORCID logo https://orcid.org/0000-0002-0949-0363
Cha, Jung Yul(차정열)
Choi, Sung Hwan(최성환) ORCID logo https://orcid.org/0000-0002-1150-0268
URI
https://ir.ymlib.yonsei.ac.kr/handle/22282913/193617
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