Effect of Topical Fluoride Application Temperature on Recharge and Rerelease in Different Restorative Materials

Abstract

Introduction and aims: This study aimed to evaluate the influence of topical fluoride application temperature on the recharge and rerelease behaviour of three fluoride-containing restorative materials treated with 1.23% acidulated phosphate fluoride (APF) gel and 8% stannous fluoride (SnF2). Methods: Specimens of an alkasite-restorative material (Cention N), a resin-modified glass ionomer (Fuji II LC), and a conventional glass ionomer (Fuji IX GP) were prepared (n = 32 per material; n = 8 for each combination of fluoride agent and temperature). After an initial 64-day fluoride release phase in deionized water, samples were recharged with APF gel or SnF2 at room temperature (23 +/- 2 degrees C) or high temperature (HT) (55 +/- 2 degrees C) for 4 minutes. Subsequent fluoride rerelease was measured for 32 days. Physicochemical properties of fluoride agents, including viscosity, temperature, and pH, were analysed. Elemental mapping of fluoride and tin distribution was performed using scanning electron microscope-energy-dispersive X-ray spectroscopy. Results: All restorative materials initially showed rapid fluoride release that decreased over 64 days. After topical application, cumulative fluoride rerelease was significantly higher under HT than room temperature across all groups (P < .05), particularly with APF gel. RMGI demonstrated the greatest fluoride rerelease, while CGI showed the highest initial release. Scanning electron microscope-energy-dispersive X-ray spectroscopy revealed higher fluoride content at HT across all materials in both surface and cross-sectional analyses, regardless of the fluoride agent used. Tin distribution was detected only in SnF2-treated groups. Conclusion: Elevated application temperature significantly improves the fluoride recharge and sustained release capacity of restorative materials, with outcomes depending on the fluoride agent and material type.(c) 2025 The Authors. Published by Elsevier Inc. on behalf of FDI World Dental Federation. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/)