A short-term clinical study of marginal bone level change around Osstem GSIII implants

Abstract

[한글]

[영문]Several new implant systems have been developed in recent years. As a result, dentists are now able to choose an implant that is most appropriate for the condition of each patient and has a high survival rate. The resulting marginal bone levels around implants following restoration are used as a reference for evaluating implant success and survival. Two design concepts that can reduce crestal bone resorption are the microthread and platform-switching concepts. These feature are incorporated into the Osstem GSIII implant system together with a tapered body, self-tapping ability, internal connection, and resorbable blast media (RBM) surface. The subjects of this study were 27 patients (79 implants) undergoing treatment with Osstem GSIII implants between October 2008 and July 2009 in the Department of Periodontology, Dental Hospital of Yonsei UniversityThe results are as follows : during the study period (average of 11.8 months after fixture installation and 7.4 months after the prosthesis delivery), (1) the short-term survival rate of GSIII implants was 100% and (2) the marginal bone loss around GSIII implants was 0.16±0.08 mm. In conclusion, this short-term clinical study has demonstrated the successful survival rates of the GSIII implant system, and that this system is associated with reduced marginal bone loss.